Photocarrier dynamic measurement of rutile TiO2 films prepared by RF magnetron reactive sputtering
نویسندگان
چکیده
منابع مشابه
CRYSTAL STRUCTURE AND OPTICAL PROPERTIES OF TiO2 THIN FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING CHARAKTERYSTYKA CIENKICH WARSTW TiO2 OTRZYMANYCH METODĄ REAKTYWNEGO ROZPYLANIA
In sputtering deposition process of TiO2, metal Ti or sintered TiO2 target is used as deposition source. In this study, we have compared the characteristic of target materials. When TiO2 target was used, stoichiometric TiO2 films was deposited under the Ar atmosphere containing 1.0% of oxygen. The highest sputtering rate under this atmosphere was 3.9nm/min at 3.4W/cm2. But, sintered TiO2 target...
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Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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ژورنال
عنوان ژورنال: Journal of Alloys and Compounds
سال: 2017
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2017.01.146